2D materials are best characterised using both Photoluminescence (PL) & ultra-low frequency Raman spectroscopy. PL is most appropriate for band structures characterisation at the micron scale. Additionally, Raman analysis very close to the laser line, allowing a precise characterisation of the number of layers of 2D materials as specific interlayer vibration modes are excited in the ultra-low spectral Raman range (< 50ms-1). Click below as we explore the application of the two techniques using one of the 2D materials, WS2 flakes.
By definition, photoluminescence is the most appropriate technique for band structures characterisation at the micron scale. Indeed, the luminescence band of a semiconductor informs directly about the bandgap energy.
Furthermore, the Raman analysis very close to the laser line allows a precise characterisation of the number of layers of a 2D material. Indeed, specific interlayer vibration modes are excited in this spectral range. Being able to have both spectroscopy techniques, photoluminescence and ultra-low frequency Raman on the same instrument is a vital feature to characterise these materials as much as possible.
Furthermore, the Raman analysis very close to the laser line allows a precise characterisation of the number of layers of a 2D material. Indeed, specific interlayer vibration modes are excited in this spectral range. Being able to have both spectroscopy techniques, photoluminescence and ultra-low frequency Raman on the same instrument is a vital feature to characterise these materials as much as possible.
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